{"title":"Metastructures-Induced Hyper-Resolution in Two-Photon Direct Laser Writing","authors":"G. Lio, R. Caputo","doi":"10.1063/9780735422902_008","DOIUrl":null,"url":null,"abstract":"Two-photon direct laser writing (TP-DLW) is widely used in stereolithographic processes for realizing sophisticated micro- and nanoscale structures with application in fluidics, photonics, and biomedical devices. In this chapter, it is detailed how leveraging on metal-dielectric metastructures with peculiar optical functionalities is possible to enhance the performance of a generic TP-DLW device, thus enabling the fabrication of all-dielectric nanostructures with hyper-resolution in height ($15\\:nm$) and width as small as $150\\:nm$. The results open new frontiers toward the realization of all-dielectric ultraflat optical elements in a noticeably shorter time than standard time-consuming electron and deep-UV lithography processes.","PeriodicalId":305057,"journal":{"name":"Hybrid Flatland Metastructures","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Hybrid Flatland Metastructures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/9780735422902_008","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Two-photon direct laser writing (TP-DLW) is widely used in stereolithographic processes for realizing sophisticated micro- and nanoscale structures with application in fluidics, photonics, and biomedical devices. In this chapter, it is detailed how leveraging on metal-dielectric metastructures with peculiar optical functionalities is possible to enhance the performance of a generic TP-DLW device, thus enabling the fabrication of all-dielectric nanostructures with hyper-resolution in height ($15\:nm$) and width as small as $150\:nm$. The results open new frontiers toward the realization of all-dielectric ultraflat optical elements in a noticeably shorter time than standard time-consuming electron and deep-UV lithography processes.