Nanometer gap detection method using GMR grating

Zihuan Xia, Yonggang Wu, Leijie Ling, G. Lv, Heyun Wu
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Abstract

In this paper the displacement of the reflection resonant peak resulting from the change of the gap between the guided-mode resonance (GMR) grating and substrate is used to measure the nanometer gap. The paper calculates double layer model and metal substrate model using rigorous coupled-wave analysis (RCWA). It is revealed that nano-gap detection using GMR grating is feasible for both dielectric and metal substrate. The detection range of resonant wavelength and gap is tunable. The detect sensitivity is investigated by varying the parameters of grating (thickness, period and refractive index), the thickness of films, and polarization. Tolerance of grating implies an advantage for manufacture. An optimized result presents an 18nm resonant shift for 100nm gap with the max sensitivity achieving 0.85.
GMR光栅纳米缝隙检测方法
本文利用导模谐振光栅与衬底之间的间隙变化引起的反射谐振峰位移来测量纳米间隙。本文采用严格耦合波分析(RCWA)计算了双层模型和金属基板模型。结果表明,利用GMR光栅对介质和金属衬底进行纳米间隙检测是可行的。谐振波长和间隙的探测范围是可调的。通过改变光栅的厚度、周期和折射率等参数、薄膜厚度和偏振度来研究探测灵敏度。光栅的公差意味着制造的优势。优化后的结果显示,在100nm的间隙内,共振位移为18nm,最大灵敏度达到0.85。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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