Semiconductor Device Parameter Extraction Based on I–V Measurements and Simulation

D. Kasprowicz
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引用次数: 1

Abstract

The paper presents a method for extracting the physical parameters of a semiconductor device based on the measurements of its electrical response (e.g. transfer characteristics) combined with simulation. Such extraction is usually performed by an optimization algorithm seeking device-parameter values that minimize the difference between the measured response and its simulated equivalent. The proposed approach needs only an average of 13 objective-function evaluations, i.e. device simulations, to extract three parameters of a single device. If the parameters of a group of devices of the same type are to be extracted, the average number of simulations drops to four per device. This number is much smaller than in conventional optimization procedures. Thus, the proposed procedure can be used even in the absence of an accurate compact model, when time-consuming TCAD simulation must be used to determine the device’s response.
基于I-V测量的半导体器件参数提取与仿真
本文提出了一种基于半导体器件的电响应测量(如传递特性)与仿真相结合提取器件物理参数的方法。这种提取通常是通过一种优化算法来实现的,该算法寻求使测量响应与其模拟等效响应之间的差异最小化的设备参数值。所提出的方法只需要平均13次目标函数评估,即设备模拟,即可提取单个设备的三个参数。如果提取一组相同类型设备的参数,则平均模拟次数降至每个设备4次。这个数字比传统的优化过程要小得多。因此,即使在没有精确的紧凑模型的情况下,当必须使用耗时的TCAD模拟来确定设备的响应时,所建议的程序也可以使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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