A 130nm partially depleted SOI technology menu for low-power applications

N. L'Hostis, A. Valentian, A. Amara
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引用次数: 3

Abstract

In this paper, we present a technology-based menu where the target performance and power consumption are achieved by selecting a given design point (supply voltage, normal V/sub T/, low V/sub T/ and DTMOS transistors) according to a given application. Through analyses made at synthesis and silicon measurements levels, it is shown that the best results are obtained by optimizing the SOI technology for the targeted power supply voltage. At the nominal 1.2V supply voltage, this is achieved by setting a higher threshold voltage V/sub T/ to limit the cut-off currents. The power gains are in the order of 25% to 30% for the same performance. To further reduce the power dissipation, targeting the ultra-low-voltage range (0.5V) is very attractive when performance is not an issue. Using low-V/sub T/ SOI transistors allows significant gains in terms of speed and power. The power-delay product of a 16-bit multiplier is improved by a 2.4 factor.
130nm部分耗尽SOI技术菜单,用于低功耗应用
在本文中,我们提出了一个基于技术的菜单,其中通过根据给定的应用选择给定的设计点(电源电压,正常V/sub T/,低V/sub T/和DTMOS晶体管)来实现目标性能和功耗。通过在合成和硅测量水平上的分析,表明优化SOI技术在目标电源电压下获得了最佳效果。在标称的1.2V电源电压下,这是通过设置更高的阈值电压V/sub /来限制截止电流来实现的。对于相同的性能,功率增益在25%到30%之间。为了进一步降低功耗,在性能不受影响的情况下,瞄准超低电压范围(0.5V)是非常有吸引力的。使用低v /sub T/ SOI晶体管可以在速度和功率方面获得显着增益。16位乘法器的功率延迟积提高了2.4倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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