UTILIZATION OF INDONESIAN LOCAL STANNIC CHLORIDE (SnCl4) PRECURSOR IN THE PROCESS OF MAKING FLUORINE- DOPED TIN OXIDE (FTO) CONDUCTIVE GLASS

T. Arini, L. H. Lalasari, L. Andriyah, G. Fahmi, F. Firdiyono
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Abstract

UTILIZATION OF INDONESIAN LOCAL STANNIC CHLORIDE (SnCl4) PRECURSOR IN THE PROCESS OF MAKING FLUORINE-DOPED TIN OXIDE (FTO) CONDUCTIVE GLASS. Thin layer of fluorine- doped tin oxide (FTO) conductive glass has been deposited on a glass substrate heated at a temperature of 350°C using the ultrasonic spray pyrolysis nebulizer method with variations in fluorine doping and substrate temperatures. This experiment uses the raw material of Indonesian local stannic chloride (SnCl4) (PT Timah Industri) as a precursor with a temperature variation of 250, 300, 350, 400°C. The structure and morphology of the optical and electrical properties of all the thin layers have been examined. XRD results show that all thin layers have a tetragonal crystal structure. In this experiment, there is a significant influence on the role of fluorine doping on resistivity and transmittance values. With the addition of 2% wt doping, the resistivity and transmittance values decrease. The optimum value is obtained by doping 2 wt%, substrate temperature of 350°C with a resistivity value of 9.28.10-5 Ω.cm and transmittance value of 88%.
利用印尼本地氯化锡(SnCl4)前驱体制备掺氟氧化锡(FTO)导电玻璃
印尼本地氯化锡(SnCl4)前驱体在掺氟氧化锡(FTO)导电玻璃生产中的应用。采用超声喷雾热解雾剂法,在350℃的温度下,随着氟掺杂和衬底温度的变化,在玻璃衬底上沉积了薄层氟掺杂氧化锡(FTO)导电玻璃。本实验以印尼本地氯化锡(SnCl4) (PT Timah Industri)为原料,温度变化范围为250、300、350、400℃。对所有薄层的光学和电学性质的结构和形态进行了研究。XRD结果表明,所有薄层均具有四方晶体结构。在本实验中,氟掺杂的作用对电阻率和透射率值有显著影响。当wt掺杂量为2%时,材料的电阻率和透射率降低。当衬底温度为350℃,掺杂量为2 wt%,电阻率为9.28.10-5 Ω时,得到最佳值。Cm,透光率88%。
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