Dynamic-ron control via proton irradiation in AlGaN/GaN transistors

A. Tajalli, A. Stockman, M. Meneghini, S. Mouhoubi, A. Banerjee, S. Gerardin, M. Bagatin, A. Paccagnella, E. Zanoni, M. Tack, B. Bakeroot, P. Moens, G. Meneghesso
{"title":"Dynamic-ron control via proton irradiation in AlGaN/GaN transistors","authors":"A. Tajalli, A. Stockman, M. Meneghini, S. Mouhoubi, A. Banerjee, S. Gerardin, M. Bagatin, A. Paccagnella, E. Zanoni, M. Tack, B. Bakeroot, P. Moens, G. Meneghesso","doi":"10.1109/ISPSD.2018.8393610","DOIUrl":null,"url":null,"abstract":"Dynamic-Ron is still a key issue in GaN power HEMTs. Recently [2] we demonstrated that proton irradiation is an effective and controllable way to reduce dynamic-Ron in AlGaN/GaN HEMTs; this beneficial effect is ascribed to the minute increase in the leakage of the uid-GaN layer, promoting charge de-trapping from the buffer. The effect is dependent on LGD, shorter LGD is better. The shorter LGD corresponds to a shorter region for trapping, and therefore the dynamic-Ron is not strong when LGD is short. We demonstrate that samples submitted to proton irradiation at high fluences (1.5×1014 p/cm2, 3 MeV) show a complete suppression of dynamic-Ron (complete voltage range, 150 °C), without significant modifications in the other device parameters. Combined pulsed measurements, drain current transient (DCT) characterization and electroluminescence (EL) analysis are used to explain the experimental data.","PeriodicalId":166809,"journal":{"name":"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2018.8393610","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Dynamic-Ron is still a key issue in GaN power HEMTs. Recently [2] we demonstrated that proton irradiation is an effective and controllable way to reduce dynamic-Ron in AlGaN/GaN HEMTs; this beneficial effect is ascribed to the minute increase in the leakage of the uid-GaN layer, promoting charge de-trapping from the buffer. The effect is dependent on LGD, shorter LGD is better. The shorter LGD corresponds to a shorter region for trapping, and therefore the dynamic-Ron is not strong when LGD is short. We demonstrate that samples submitted to proton irradiation at high fluences (1.5×1014 p/cm2, 3 MeV) show a complete suppression of dynamic-Ron (complete voltage range, 150 °C), without significant modifications in the other device parameters. Combined pulsed measurements, drain current transient (DCT) characterization and electroluminescence (EL) analysis are used to explain the experimental data.
质子辐照在AlGaN/GaN晶体管中的动态控制
动态ron仍然是GaN功率hemt中的一个关键问题。最近[2]我们证明了质子辐照是降低AlGaN/GaN hemt中动态ron的有效和可控的方法;这种有益的效果归因于液体氮化镓层泄漏的微小增加,促进了电荷从缓冲液中释放出来。效果与LGD有关,LGD越短越好。较短的LGD对应较短的捕获区域,因此LGD较短时动态ron不强。我们证明了样品在高通量(1.5×1014 p/cm2, 3 MeV)下进行质子辐照,显示出动态ron(完整电压范围,150°C)的完全抑制,而其他器件参数没有明显改变。结合脉冲测量、漏极电流瞬态(DCT)表征和电致发光(EL)分析来解释实验数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信