Impact of temperature on the performance of sub-35nm symmetric Double Gate Junctionless Transistor based inverter using High-K gate dielectric, a TCAD simulation study

Uttam Ch. Boro, N. Bora, P. Pegu, R. Subadar
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引用次数: 2

Abstract

In this paper, the effect High Temperature on the performance of a symmetric double gate junctionless transistor based inverter is analyzed. 3D simulations are performed using COGENDA 3D TCAD tool to investigate its switching characteristics, voltage transfer characteristics, output current and noise margin at different temperatures. High-K gate dielectric material (HFO2) is used as the gate oxide to achieve improved device characteristics and hence the inverter performance.
温度对基于高k栅极介质的亚35nm对称双栅无结晶体管逆变器性能的影响进行了TCAD仿真研究
本文分析了高温对对称双栅无结晶体管逆变器性能的影响。利用COGENDA 3D TCAD工具进行三维仿真,研究其在不同温度下的开关特性、电压转移特性、输出电流和噪声裕度。采用高k栅极介电材料(HFO2)作为栅极氧化物,以改善器件特性,从而提高逆变器性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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