Clarification of Error Factors in Thermal Impedance Measurements Using SiC-MOSFET Body Diodes Compared to SWITCH-MOS

F. Kato, Shinji Sato, Shinsuke Harda, H. Hozoji, A. Sakai, Kinuyo Wantanabe, H. Yamaguchi, Hiroshi Sato
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Abstract

In this paper, we measured and compared the thermal impedance (Zth) of silicon carbide (SiC) power module assembled with a Schottky barrier diode wall-integrated trench MOSFET (SWITCH-MOS; hereafter SMOS) and a conventional trench-gate MOSFET (UMOS). The temperature was detected by the Schottky barrier diode (SBD) for the SMOS and the pin diode for the UMOS. Since the knee voltage in UMOS varies with the gate voltage, a deep negative gate bias was needed to avoid this effect. A gate bias of –18 V is applied to the UMOS. However, no gate bias was required for the SMOS. The measured Zth was in good agreement between the UMOS and SMOS modules. Therefore, we can conclude that the SMOS can measure transient temperature at the same location as UMOS. In addition, the SBD built into the SMOS allows for easier and more accurate measurement of SiC-MOSFET junction temperature.
澄清使用SiC-MOSFET体二极管与开关- mos进行热阻抗测量时的误差因素
在本文中,我们测量并比较了与肖特基势垒二极管(wall-integrated trench MOSFET, SWITCH-MOS)组装的碳化硅(SiC)功率模块的热阻抗Zth;(以下简称SMOS)和传统的沟栅MOSFET (UMOS)。温度由SMOS的肖特基势垒二极管(SBD)和UMOS的引脚二极管检测。由于UMOS中的膝电压随栅极电压变化,因此需要一个深负栅极偏置来避免这种影响。对UMOS施加-18 V的栅极偏置。然而,SMOS不需要栅极偏置。测量的Zth在UMOS和SMOS模块之间的一致性很好。因此,我们可以得出结论,SMOS可以在与UMOS相同的位置测量瞬态温度。此外,SMOS内置的SBD可以更轻松,更准确地测量SiC-MOSFET结温。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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