Investigation of Stresses in GaN HEMT Layers on a Diamond Substrate Using Micro-Raman Spectroscopy

B. L. Hancock, M. Nazari, Jonathan Anderson, E. Piner, M. Holtz
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引用次数: 3

Abstract

Visible and ultraviolet (UV) micro-Raman spectroscopies are used to study the stress in GaN integrated with diamond grown by chemical vapor deposition. Mapping of stress is accomplished across a 75-mm GaN-on-diamond wafer. UV measurements from both sides of the wafer reveal an unexpected gradient between the tensile stress from the free GaN surface (~0.86 GPa) and the GaN/Diamond interface (~0.23 GPa). This gradient is understood through non-uniformities in the material along the growth direction of the layers, with relaxation attributed to threading dislocations. Simulations incorporating stress relaxation in the elastic modulus describe the observed dependence. Measurements from TEM support this conclusion.
用微拉曼光谱研究金刚石衬底上GaN HEMT层的应力
利用可见和紫外微拉曼光谱研究了化学气相沉积法生长的金刚石中氮化镓的应力。在75毫米的GaN-on-diamond晶圆上完成应力映射。从晶圆的两侧进行的紫外测量显示,自由GaN表面的拉伸应力(~0.86 GPa)和GaN/金刚石界面的拉伸应力(~0.23 GPa)之间存在意想不到的梯度。这种梯度是通过材料沿着层的生长方向的不均匀性来理解的,弛豫归因于螺纹位错。在弹性模量中加入应力松弛的模拟描述了观察到的依赖性。TEM测量结果支持这一结论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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