{"title":"Raman Analysis of Inorganic Thin Films*","authors":"D. Tallant, K. Higgins, P. Hargis, A. Stewart","doi":"10.1364/lmd.1987.wa3","DOIUrl":null,"url":null,"abstract":"Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.","PeriodicalId":331014,"journal":{"name":"Topical Meeting on Lasers in Materials Diagnostics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Topical Meeting on Lasers in Materials Diagnostics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/lmd.1987.wa3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.