Keynote speech 1: Leakage power in nanometric CMOS: Challenges and trends

J. Figueras
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Abstract

As technology is scaled down in the nanometric dimensions of the devices, the variability of the manufacturing process on the circuit parameters becomes critical. In addition, environmental changes in power supply voltages and temperature on chip gradients add new uncertainties on future electronic circuits and systems. The VLSI design paradigms are to be profoundly revised. The classical “design margin” approach to compensate for uncertainty becomes ineffective and costly. An emerging design approach consists in the provision of “on-chip adaptivity” to compensate dynamically to variability: Process parameters, Voltage, Temperature and Aging (PVTA).
主题演讲1:纳米CMOS的泄漏功率:挑战与趋势
随着技术在器件的纳米尺度上的缩小,电路参数的制造过程的可变性变得至关重要。此外,电源电压和芯片上温度梯度的环境变化为未来的电子电路和系统增加了新的不确定性。超大规模集成电路的设计范式将得到深刻的修订。补偿不确定性的经典“设计余量”方法变得无效且代价高昂。一种新兴的设计方法包括提供“片上自适应”来动态补偿可变性:工艺参数、电压、温度和老化(PVTA)。
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