Feasibility of VUV lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797480

N. Shiraishi, S. Owa

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Abstract

The feasibility of F/sub 2/ lithography (VUV lithography) was discussed positively from a viewpoint of optical materials and mask materials. The laser durability of CaF/sub 2/ and new materials for the F/sub 2/ mask substrate are discussed.

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VUV光刻的可行性

从光学材料和掩模材料的角度积极探讨了F/sub /光刻技术(VUV光刻)的可行性。讨论了CaF/ sub2 /的激光耐久性和F/ sub2 /掩模基板的新材料。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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