{"title":"Charging Damage and Product Impact in a Bulk CMOS Technology","authors":"T. Hook, C. Musante, D. Harmon, T. Sullivan","doi":"10.1109/ICICDT.2006.220805","DOIUrl":null,"url":null,"abstract":"In this paper, we tabulate the characteristics of antennas in several real designs in a 180-nm technology, and show data indicating that the product is not as susceptible to charging damage as the test structures used to control the process line. The experiment consisted of evaluating a large (500 pieces) sample of parts with considerable process-induced antenna damage - and yet no measurable degradation in product performance, yield, or reliability was found","PeriodicalId":447050,"journal":{"name":"2006 IEEE International Conference on IC Design and Technology","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Conference on IC Design and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2006.220805","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
In this paper, we tabulate the characteristics of antennas in several real designs in a 180-nm technology, and show data indicating that the product is not as susceptible to charging damage as the test structures used to control the process line. The experiment consisted of evaluating a large (500 pieces) sample of parts with considerable process-induced antenna damage - and yet no measurable degradation in product performance, yield, or reliability was found