Topology optimization for piezoresistive nanomechanical surface stress sensors in anisotropic 〈111〉 orientations

C. Zhuang, K. Minami, Kota Shiba, Genki Yoshikawa
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Abstract

Microelectromechanical systems (MEMS)-based piezoresistive nanomechanical sensors are compact sensing platforms widely employed in vapor sensing, environmental monitoring, and biosensing. Despite their extensive utility, their lower sensitivity relative to their optical readout counterparts has been a limiting factor, constraining the wider application of this technology. Prior research has suggested that alternative silicon orientations, such as 〈111〉 orientations in (110) wafers, can significantly improve the sensitivity of piezoresistive sensors. However, the complexity of optimizing two-dimensional stress distribution and handling anisotropic elasticity has made device design a formidable task, leaving this promising avenue largely unexplored. To address this challenge, we employ density-based topology optimization to generate a series of optimized designs for piezoresistive nanomechanical sensors manufactured along 〈111〉 orientations. The properties of the immobilization layer—the functional coating on the sensor—are parametrically varied to explore optimal designs. Our study reveals a transition in optimized designs from a double-cantilever configuration to a suspended platform configuration, dictated by the stiffness ratio between the immobilization layer and the silicon layer. This transition is attributed to the shift in the neutral plane and the prevailing stress relaxation mechanism. In addition, we scrutinize the effects of piezoresistor geometry and find that the optimized designs depend asymmetrically on the piezoresistor position, a characteristic stemming from the anisotropic elasticity in 〈111〉 orientations. These optimized designs, verified by finite element analysis (FEA), demonstrate a notable improvement in sensitivity of more than 20% when benchmarked against traditional rectangular designs and equivalent optimized designs in conventional orientations, thereby validating the effectiveness of the present model. This study provides crucial knowledge for the design of piezoresistive biosensors, facilitating more efficient geometric design in future sensor development.
各向异性< 111 >取向压阻式纳米表面应力传感器的拓扑优化
基于微机电系统(MEMS)的压阻式纳米机械传感器是一种小型传感平台,广泛应用于蒸汽传感、环境监测和生物传感等领域。尽管它们具有广泛的用途,但相对于光学读数,它们的低灵敏度一直是限制因素,限制了该技术的更广泛应用。先前的研究表明,替代硅取向,如(110)晶圆中的< 111 >取向,可以显着提高压阻传感器的灵敏度。然而,优化二维应力分布和处理各向异性弹性的复杂性使得器件设计成为一项艰巨的任务,使这一有前途的途径在很大程度上未被探索。为了解决这一挑战,我们采用基于密度的拓扑优化来生成一系列沿着< 111 >方向制造的压阻式纳米机械传感器的优化设计。固定化层(传感器上的功能涂层)的性能参数化变化以探索最佳设计。我们的研究揭示了优化设计从双悬臂结构到悬浮平台结构的转变,这是由固定层和硅层之间的刚度比决定的。这种转变归因于中性面的转变和普遍存在的应力松弛机制。此外,我们仔细研究了压阻几何形状的影响,发现优化设计不对称地依赖于压阻位置,这是源于< 111 >方向上的各向异性弹性的特征。通过有限元分析(FEA)验证,与传统矩形设计和传统方向等效优化设计相比,优化设计的灵敏度提高了20%以上,从而验证了该模型的有效性。该研究为压阻式生物传感器的设计提供了重要的知识,促进了未来传感器开发中更有效的几何设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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