Identifying The Source Of Dust Produced During LSI Fabrication

Abstract

A quick and convenient system for identifying accidental dust sources has been developed for LSI cleanrooms. The identification system is based on two kinds of characterization methods of the cleanroom dust generation rate monitor data. One is the characterization of the shape of the curve showing the relationship between the dust generation rate and time using the Weibull parameters, and the other is characterization by dust particle size distribution. Dust generated by moving workers and dust due to accidental leakage of water mist from a bench used to rinse wafers can be readily distinguished and identified by the system.