{"title":"mm W and High Speed Solutions Enabled by FD-SOI","authors":"S. Voinigescu","doi":"10.1109/ESSCIRC.2018.8494295","DOIUrl":null,"url":null,"abstract":"This paper will discuss the transistor level and building block characterization of 22-nm FD-SOI CMOS technology in the 25 to 125 oC range over the entire mm-wave frequency band through 325 GHz. Unlike older generation planar bulk CMOS or newer generation FinFET CMOS technologies, FD-SOI benefits from low capacitive parasitics, back-gate control of all DC and mm-wave characteristics, and dielectric isolation between transistors and between the transistor and the silicon substrate. All these features, in combination, along with minimal self-heating and the possibility to use extended source/drain contact stripes and gate pitch to overcome metal electromigration limitations at high temperature, uniquely position 22-nm FD-SOI CMOS to tackle mmwave and ultra-broadband 5G, automotive radar, mm-wave low-power sensor networks as well 56-GBaud and 112-GBaud ADC/DAC-based fibre-optics systems.","PeriodicalId":355210,"journal":{"name":"ESSCIRC 2018 - IEEE 44th European Solid State Circuits Conference (ESSCIRC)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSCIRC 2018 - IEEE 44th European Solid State Circuits Conference (ESSCIRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIRC.2018.8494295","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper will discuss the transistor level and building block characterization of 22-nm FD-SOI CMOS technology in the 25 to 125 oC range over the entire mm-wave frequency band through 325 GHz. Unlike older generation planar bulk CMOS or newer generation FinFET CMOS technologies, FD-SOI benefits from low capacitive parasitics, back-gate control of all DC and mm-wave characteristics, and dielectric isolation between transistors and between the transistor and the silicon substrate. All these features, in combination, along with minimal self-heating and the possibility to use extended source/drain contact stripes and gate pitch to overcome metal electromigration limitations at high temperature, uniquely position 22-nm FD-SOI CMOS to tackle mmwave and ultra-broadband 5G, automotive radar, mm-wave low-power sensor networks as well 56-GBaud and 112-GBaud ADC/DAC-based fibre-optics systems.