Heteroepitaxy of Cubic GaN

A. Trampert, O. Brandt, H. Yang, K. Ploog
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引用次数: 3

Abstract

We report on the epitaxial growth and the microstructure of cubic GaN. The layers investigated are deposited by plasma-assisted molecular beam epitaxy on GaAs (001) and (311)A substrates. Transmission electron microscopy reveals that, despite of the extreme lattice mismatch between these two materials, GaN grows in the metastable cubic phase with a well-defined orientation-relationship to the substrate and a sharp heteroboundary. This preference of the metastable phase and its epitaxial orientation originate in the initial stage of growth which is discussed in connection with a coincidence lattice for the investigated interface structures.
异性恋或立方性甘
我们报道了立方氮化镓的外延生长和微观结构。利用等离子体辅助分子束外延在GaAs(001)和GaAs (311)A衬底上沉积了所研究的层。透射电镜显示,尽管这两种材料之间存在极端的晶格不匹配,但GaN在亚稳立方相中生长,与衬底具有明确的取向关系和尖锐的异质边界。亚稳相及其外延取向的这种偏好起源于生长的初始阶段,这与所研究的界面结构的重合晶格有关。
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