Analysis of the Factors Limiting the RF Breakdown Voltage in SiGe HBTs for Wi-Fi PA Applications

Ajay Raman, V. Jain, Elanchezhian Veeramani, Beng Woon Lim, U. Raghunathan, Y. Ngu, A. Joseph
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引用次数: 1

Abstract

For the first time, we present a comprehensive study of the dependence of the RF breakdown voltage of a Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) on the DC breakdown metrics, device size, geometry, bias conditions and temperature. We explore the RF breakdown voltage of a SiGe HBT based on the 4th generation GLOBALFOUNDRIES 350nm PA technology and show that the collector-base breakdown voltage with emitter open (BVCBO) is more important in determining the RF breakdown of the HBT than the collector-emitter breakdown voltage with base open (BVCEO). We also show that the RF breakdown voltage and the Safe Operating Area (SOA) of the device are strongly dependent on the device size, and that the thermal effects significantly impact the RF breakdown voltage of the device.
Wi-Fi PA应用SiGe hbt射频击穿电压限制因素分析
本文首次全面研究了硅锗(SiGe)异质结双极晶体管(HBT)的射频击穿电压与直流击穿指标、器件尺寸、几何形状、偏置条件和温度的关系。我们研究了基于第四代GLOBALFOUNDRIES 350nm PA技术的SiGe HBT的射频击穿电压,并表明发射极打开时集电极-发射极击穿电压(BVCBO)比基极打开时集电极-发射极击穿电压(BVCEO)更能决定HBT的射频击穿。我们还表明,器件的射频击穿电压和安全工作区域(SOA)强烈依赖于器件尺寸,并且热效应显著影响器件的射频击穿电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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