InP/InGaAs double heterojunction bipolar transistor (DHBT) with an emitter tunneling barrier and composite collector structure

W. Chiou, C. Chen, C. Wang, H. Chuang, X. Liao, K. Lee, S. Tsai, C. Lu, W. Liu
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Abstract

The DC performances of a novel InP/InGaAs double-heterojunction bipolar transistor (DHBT) with the undoped tunneling barrier and composite collector structure are studied and demonstrated. Due to the mass filtering effect for holes, a thin InP tunneling barrier can be used to replace the wide-gap emitter. Experimentally, an extremely small offset voltage of 25 mV and breakdown voltage BV/sub CEO/ of 9.2 V are obtained. Furthermore, the abrupt junction and /spl delta/-doping structure can eliminate the carrier blocking effect effectively when electrons are transported across the base-collector heterojunction. Meanwhile, the DC current gain is almost independent of the perimeter-to-area ratio of the emitter due to the low surface recombination.
具有发射极隧道势垒和复合集电极结构的InP/InGaAs双异质结双极晶体管(DHBT)
研究并验证了一种新型具有未掺杂隧道势垒和复合集电极结构的InP/InGaAs双异质结双极晶体管(DHBT)的直流性能。由于空穴的质量滤波效应,可以用薄的InP隧穿势垒代替宽隙发射极。实验得到了极小的偏置电压为25 mV,击穿电压BV/sub CEO/为9.2 V。此外,突变结和/spl δ /掺杂结构可以有效地消除电子在基底-集电极异质结中传输时的载流子阻塞效应。同时,由于低表面复合,直流电流增益几乎与发射极的周长面积比无关。
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