Magnetron deposition of MoS2 ultrathin films in conditions of magnetic field.

Abstract

Molybdenum disulfide (MoS2) ultrathin films have been deposited onto Si substrates with different deposition parameters by DC-magnetron sputtering (DCMS) using of external magnetic field (MF) to contribute to the improvement of the promising device's characteristics for nano, optoelectronics, plasmonic, and spintronics. The film properties and morphology structure were compared in the case of the MF presence and its absence, varying the pole of the magnet, deposition time, the slope of the substrate holder, and the magnetic induction. The influence of MF on the MoS2 thin films parameters such as grain size, surface roughness, bandgap energy, was studied by using atomic force microscopy (AFM) and spectrophotometry.