Double gate junctionless MOSFET simulation and comparison with analytical model

Guang-Ming Zhang, Yi Su, Hsin-Yi Hsin, Y. Tsai
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引用次数: 3

Abstract

This paper uses the C++ to develop an adapted band matrix solver to simulate the i-v curve and the drain current of the 2-D double-gate n-channel MOSFET, including different doping concentrations which from 5×10 (cm-3) to 5×10 (cm-3) and channel thickness which from 5 nm to 15 nm. And it discusses the threshold voltage from the i-vg curve and selects the more appropriate doping concentration and channel thickness to complete the following experiments. And then it simulates if-vg curve to determine threshold voltage which can present the channel on-off situation and calculates drain current which is in different gate voltage. It also can simulate the electric potential of the x-axis and y-axis. In the figure of the electric potential we can obtain the depletion width. It also analyzes the subthreshold, the linear and the saturation region in i-v curve, and we can find out the values of sub-threshold swing in the subthreshold region of the i-v curve and the value of the drain current in the saturation region of the i-v curve. It compares the results with the other reference papers. Finally, the equations of the threshold voltage can be developed, and we calculate the threshold voltage of double-gate n-channel MOSFET. The result obtained by the equation of the threshold voltage will be compared with result by 2-D simulation. The depletion width can be obtained as an analytical equation. The analytical depletion width can be verified by the figure of the x-axis and y-axis electric potential from 2-D simulation. The 2-D simulation also verifies the result with the drain current equation which is obtained by Pois-son's equation. For circuit application, an inverter including a double-gate n-channel MOSFET and a 100kΩ resistor will be used to simulate the vo-vi characteristics and analyzes the parameters of the inverter (e.g. VOh, VOl, Vih, Vil, VS), and the noise margin (e.g. NML, NMH) will be calculated in order to determine the inverter's performance and quality.
双栅无结MOSFET仿真及与解析模型的比较
本文利用c++开发了一种适应的带矩阵求解器,模拟了二维双栅n沟道MOSFET的i-v曲线和漏极电流,包括掺杂浓度从5×10 (cm-3)到5×10 (cm-3)和沟道厚度从5 nm到15 nm。并从i-vg曲线中讨论阈值电压,选择更合适的掺杂浓度和通道厚度来完成接下来的实验。然后通过对if-vg曲线的模拟,确定能表示通道通断情况的阈值电压,并计算出在不同栅极电压下的漏极电流。它还可以模拟x轴和y轴的电势。在电势图中,我们可以得到耗尽宽度。并对i-v曲线的亚阈区、线性区和饱和区进行了分析,得出了i-v曲线的亚阈区摆幅值和i-v曲线的饱和区漏极电流值。并将结果与其他参考文献进行了比较。最后,推导出阈值电压方程,并计算出双栅n沟道MOSFET的阈值电压。将阈值电压方程的计算结果与二维仿真结果进行比较。耗尽宽度可以用解析方程表示。通过二维模拟得到的x轴和y轴电势图,可以验证分析得到的损耗宽度。二维仿真也与用泊松方程得到的漏极电流方程进行了验证。对于电路应用,将使用包含双栅n沟道MOSFET和100kΩ电阻的逆变器来模拟vo-vi特性并分析逆变器的参数(例如VOh, VOl, Vih, Vil, VS),并计算噪声裕度(例如NML, NMH),以确定逆变器的性能和质量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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