Temperature dependence of electrical characteristics of Al/p-Si(100) and Ti/p-Si(100) Schottky barrier diodes

Arely Vazquez, J. Molina
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Abstract

Current-voltage (I–V) and capacitance-voltage (C-V) characteristics on Al/p-Si (100) and Ti/p-Si (100) Schottky barrier diodes (SD) were carried out in a temperature range of 25–85°C. The zero-bias Schottky barrier height (SBH) and ideality factor n were calculated for both metal-semiconductor (MS) structures by using thermionic emission theory showed a strong dependence on temperature. The metals employed (aluminum and titanium) in the fabrication process were characterized to obtain electrical and physical parameters.
Al/p-Si(100)和Ti/p-Si(100)肖特基势垒二极管电特性的温度依赖性
研究了Al/p-Si(100)和Ti/p-Si(100)肖特基势垒二极管(SD)在25-85℃温度范围内的电流-电压(I-V)和电容-电压(C- v)特性。利用热离子发射理论计算了金属-半导体(MS)结构的零偏肖特基势垒高度(SBH)和理想因子n,结果表明这两种结构对温度有很强的依赖性。在制造过程中使用的金属(铝和钛)进行表征,以获得电气和物理参数。
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