Characterizing effects of radiation on forward and reverse saturation characteristics of n-channel devices [SRAMs]

M.N. Jaafar Ali, B. Bhuva, S. Kerns, M. Maher, R. Lawrence, A. Hoffmann
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Abstract

The forward and reverse characteristics of an n-channel device during the saturation mode of operation are used to determine the extent of damage non-uniformity along the channel. The non-uniformity increases with the total dose. The unmatched forward and reverse characteristics will be a major problem for memory circuits for advanced technologies.
辐射对n沟道器件正反饱和特性影响的表征[sram]
在饱和工作模式下,n通道器件的正向和反向特性用于确定沿通道的损伤不均匀性的程度。不均匀性随总剂量增加而增加。不匹配的正向和反向特性将成为先进技术存储电路的主要问题。
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