Simulation of gallium-arsenide based high electron mobility transistors

R. Quay, H. Massler, W. Kellner, T. Grasser, V. Palankovski, S. Selberherr
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引用次数: 7

Abstract

We present results for hydrodynamic simulations of pseudomorphic AlGaAs-InGaAs-GaAs high electron mobility transistors (HEMTs) obtained by the MINIMOS-NT two-dimensional device simulator. The concise analysis of industrially relevant HEMT power devices of two different foundries for gate-lengths between l/sub g/=140 nm and l/sub g/=300 nm is carried out. Several aspects, including thermal and breakdown effects, the insulator-semiconductor interface, and the Schottky contact are considered.
基于砷化镓的高电子迁移率晶体管的模拟
本文介绍了利用MINIMOS-NT二维器件模拟器获得的假晶AlGaAs-InGaAs-GaAs高电子迁移率晶体管(HEMTs)的流体动力学模拟结果。对栅极长度在l/sub g/=140 nm和l/sub g/=300 nm之间的两种不同晶圆厂的工业相关HEMT功率器件进行了简要分析。考虑了几个方面,包括热效应和击穿效应,绝缘体-半导体界面和肖特基接触。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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