Generation and characterization of copper nanowires, nanoparticles, and thin films by flow- limited field-injection electrostatic spraying

P. Heil, W. Gu, Sangho Lim, Hyungsoo Choi, K. Kim
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Abstract

Nanoscale structures of copper including nanowires, nanoparticles, and thin films were produced using flow-limited field-injection electrostatic spraying (FFESS) combined with chemical vapor deposition (CVD). The FFESS system allowed for efficient vaporization and delivery of the CVD precursor. The system also allowed for control of the type of structures based on deposition parameters. X-ray photoelectron spectroscopy (XPS) data confirmed that the samples were pure copper.
用限流场静电喷涂技术制备铜纳米线、纳米粒子和薄膜
采用限流场静电喷涂(FFESS)和化学气相沉积(CVD)相结合的方法制备了铜的纳米结构,包括纳米线、纳米颗粒和薄膜。FFESS系统允许有效的汽化和CVD前驱体的输送。该系统还允许根据沉积参数控制结构的类型。x射线光电子能谱(XPS)数据证实样品为纯铜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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