Technology Trends and Characteristics of Patent Information Disclosure in Advanced Semiconductor Photoresist

Abstract

This paper focuses on advanced semiconductor photoresists and analyzes the patent data from the following four perspectives: relationship between semiconductor trends and resists; profit gains of the photoresist industry; advanced extreme ultraviolet lithography trends and sustainable development goals (SDGs); and patent quality and filing trends for photoresists. As a result, we obtain the trend of semiconductor photoresists accurately reflecting miniaturization and its relation to SDGs. In addition, a guideline for patent quality and information disclosure characteristics is obtained. Photoresist is a crucial component of the semiconductor industry in miniaturization, and patents are an effective application tool for the trend investigation.