M. Mochizuki, H. Hayashi, S. Ishii, S. Ohira, I. Kurachi, N. Miura
{"title":"Accurate and global model of SOI H gate body-tied MOSFET for circuit simulator","authors":"M. Mochizuki, H. Hayashi, S. Ishii, S. Ohira, I. Kurachi, N. Miura","doi":"10.1109/SISPAD.2011.6035071","DOIUrl":null,"url":null,"abstract":"Drain current of SOI H-type body-tied MOSFET can be modulated in gate length or width because of its additional gate region. It causes a serious problem especially in analog circuit design. There is, however, no model including the gate shape effect even in the newest release BSIMSOI [1]. An accurate and global model of SOI H-type body-tied MOSFET in circuit simulation has been proposed for the first time. It is confirmed that the simulation accuracy of the proposed model has greatly improved within 10% RMS error compared to the existing model.","PeriodicalId":264913,"journal":{"name":"2011 International Conference on Simulation of Semiconductor Processes and Devices","volume":"237 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2011.6035071","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Drain current of SOI H-type body-tied MOSFET can be modulated in gate length or width because of its additional gate region. It causes a serious problem especially in analog circuit design. There is, however, no model including the gate shape effect even in the newest release BSIMSOI [1]. An accurate and global model of SOI H-type body-tied MOSFET in circuit simulation has been proposed for the first time. It is confirmed that the simulation accuracy of the proposed model has greatly improved within 10% RMS error compared to the existing model.
SOI h型体系MOSFET的漏极电流可以在栅极长度或宽度上进行调制,因为它具有额外的栅极区。这在模拟电路设计中引起了严重的问题。然而,即使在最新发布的BSIMSOI[1]中,也没有包含栅极形状效应的模型。首次在电路仿真中提出了一种精确的、全局的SOI h型体系MOSFET模型。结果表明,与现有模型相比,所提模型的仿真精度在10%的RMS误差范围内有较大提高。