Application of numerical simulations for determination of thin film optical parameters

Abstract

The application of numerical simulations for investigation of thin film optical parameters is presented. A brief description of a color coordinates method for film optical constants determination, recently developed by the authors of this article, is given. The minimal film thickness, for which this method is applicable, is evaluated for different materials. A new method for investigation of optical inhomogeneity (refractive index distribution in the film depth) is described. The application of numerical simulation for the design of multilayer coatings, with predetermined spectral properties, is discussed. Some design examples of multilayer antireflectance (AR) coatings for semiconductor optoelectronic device requirements are given.