{"title":"FD-SOI Technology Development and Key Devices Characteristics for Fast, Power Efficient, Low Voltage SoCs","authors":"J. Hartmann","doi":"10.1109/CSICS.2014.6978554","DOIUrl":null,"url":null,"abstract":"Electronics is more and more pervasive in everyday life: smartphones, connected cars, Internet of Things... All this is not only about mobile energy efficient technologies: it is wireless and wireline connectivity, sensors. UTBB FD-SOI (Ultra Thin Body and Buried-oxide Fully Depleted Silicon On Insulator) is a planar semiconductor technology that introduced the advantages of fully depleted transistors from the 28nm technology node, which is cost optimal, allowing joining the advantages of a general purpose high speed technology with the ones of a low power one. The paper describes the development of the FD-SOI technology, the choice of devices centering, and their main characteristics, especially suited for high speed energy efficient operation, even in low voltage conditions, thanks to the their intrinsic characteristics offered by being fully depleted. Those, are not limited to digital logic devices, but extend to memory bit-cells (fast, low leakage, and operating at low voltage) and the exceptional analog characteristics of devices.","PeriodicalId":309722,"journal":{"name":"2014 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2014-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2014.6978554","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
Electronics is more and more pervasive in everyday life: smartphones, connected cars, Internet of Things... All this is not only about mobile energy efficient technologies: it is wireless and wireline connectivity, sensors. UTBB FD-SOI (Ultra Thin Body and Buried-oxide Fully Depleted Silicon On Insulator) is a planar semiconductor technology that introduced the advantages of fully depleted transistors from the 28nm technology node, which is cost optimal, allowing joining the advantages of a general purpose high speed technology with the ones of a low power one. The paper describes the development of the FD-SOI technology, the choice of devices centering, and their main characteristics, especially suited for high speed energy efficient operation, even in low voltage conditions, thanks to the their intrinsic characteristics offered by being fully depleted. Those, are not limited to digital logic devices, but extend to memory bit-cells (fast, low leakage, and operating at low voltage) and the exceptional analog characteristics of devices.
电子产品在日常生活中越来越普遍:智能手机、联网汽车、物联网……所有这一切不仅仅是关于移动节能技术:它是无线和有线连接,传感器。UTBB FD-SOI (Ultra Thin Body and buredoxide Fully贫化硅绝缘体)是一种平面半导体技术,它从28nm技术节点引入了完全耗尽晶体管的优势,这是成本最优的,允许将通用高速技术的优势与低功耗技术的优势结合起来。本文介绍了FD-SOI技术的发展,器件定心的选择,以及它们的主要特性,特别是适用于高速节能运行,即使在低电压条件下,由于它们的内在特性提供了完全耗尽。这些并不局限于数字逻辑器件,而是扩展到存储位单元(快速、低漏和在低电压下工作)和器件的特殊模拟特性。