{"title":"The application of TRIZ algorithm solve the problem of byproduct Hsin, Yi-Fang","authors":"Chen Guan-ting, Chou Ming-Kuan, Huang Kuo-Chan, Lu Chien-Hui, Tseng Yun-Chieh, Chao Chia-chi","doi":"10.23919/ISSM.2017.8089086","DOIUrl":null,"url":null,"abstract":"The research used TRIZ innovation methodology which included the model of the technical contradictions, physical contradictions, and the inventive theory of asymmetry — preliminary action · nesting — extraction principles, to optimize the design and improve the Lamp anneal process of diffusion machine. The inventive embodiment consisted of the following four parts as: 1. Add the wafer Pre-clean step, 2. Change the design of blowing ports, 3. Change the design of air inlet, 4. Adjust the structure of the chamber (Figure 5). Above part 2–3 are key inventions to be implemented and will change the air flow to reduce the adhersion of vaporized byproduct completedly. Part 1 & 4 are optional to improve the reduction of adhersion more effectively. In addition, the simulation of airflow rate distribution manifested that the distribution of flow velocity could be changed and produced a gradually higher speed airflow from the top to the bottom. The out-gassing of the wafer near the backside could be expelled by the airflow of lower area while keeping original airflow distribution of upper area. The invention reduced the probability of vaporized byproduct adhering to the quartz and lessen the wafer surface thermal effect, so that the process reached stability and machine up-time was soaring.","PeriodicalId":280728,"journal":{"name":"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)","volume":"90 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/ISSM.2017.8089086","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The research used TRIZ innovation methodology which included the model of the technical contradictions, physical contradictions, and the inventive theory of asymmetry — preliminary action · nesting — extraction principles, to optimize the design and improve the Lamp anneal process of diffusion machine. The inventive embodiment consisted of the following four parts as: 1. Add the wafer Pre-clean step, 2. Change the design of blowing ports, 3. Change the design of air inlet, 4. Adjust the structure of the chamber (Figure 5). Above part 2–3 are key inventions to be implemented and will change the air flow to reduce the adhersion of vaporized byproduct completedly. Part 1 & 4 are optional to improve the reduction of adhersion more effectively. In addition, the simulation of airflow rate distribution manifested that the distribution of flow velocity could be changed and produced a gradually higher speed airflow from the top to the bottom. The out-gassing of the wafer near the backside could be expelled by the airflow of lower area while keeping original airflow distribution of upper area. The invention reduced the probability of vaporized byproduct adhering to the quartz and lessen the wafer surface thermal effect, so that the process reached stability and machine up-time was soaring.