A. Porzio, F. Velardi, G. Busatto, F. Iannuzzo, A. Sanseverino, G. Currò
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引用次数: 8
Abstract
In this paper we present a 3-D simulation study, based on experimental observation, which describes the role played by the strong increase of the electric field in the occurrence of gate damages induced by an heavy ion impact on typical medium power MOSFET devices.