30-nm-channel-length c-axis aligned crystalline In-Ga-Zn-O transistors with low off-state leakage current and steep subthreshold characteristics

S. Matsuda, T. Hiramatsu, R. Honda, D. Matsubayashi, H. Tomisu, Y. Kobayashi, K. Tochibayashi, R. Hodo, H. Fujiki, Y. Yamamoto, M. Tsubuku, Y. Okazaki, S. Yamazaki
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引用次数: 18

Abstract

We report the world's smallest field effect transistors (FETs) with channel lengths of 32 nm including c-axis aligned crystalline (CAAC) In-Ga-Zn-O as their active layers, which achieve low off-state leakage currents. Furthermore, these FETs exhibit excellent subthreshold swing values despite having thick gate insulating film. The FET operation has been achieved owing to the 3D gate structure with a thin active layer, due to the FETs being accumulation-type FETs with intrinsic channels, and due to the dielectric anisotropy of the CAAC crystal structure.
30纳米通道长度的c轴排列晶体In-Ga-Zn-O晶体管,具有低的断开状态泄漏电流和陡峭的亚阈值特性
我们报道了世界上最小的场效应晶体管(fet),通道长度为32 nm,其中包括c轴排列晶体(CAAC) In-Ga-Zn-O作为其有源层,实现了低的断开状态泄漏电流。此外,尽管具有较厚的栅极绝缘膜,这些fet仍表现出优异的亚阈值摆动值。由于具有薄有源层的三维栅极结构,由于FET是具有本征沟道的积累型FET,以及由于CAAC晶体结构的介电各向异性,FET工作得以实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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