Continuous localisation-delocalisation transition at intermediate electron densities

D. Neilson, J. Thakur
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引用次数: 3

Abstract

We find in 2D electron layers in quantum transistors that the interplay between the electron correlations and their interactions with defects in the semiconductor substrate generates a continuous localisation–delocalisation transition for intermediate electron densities (5 l rs l 9). We distinguish this transition from the discontinuous metal–insulator transition which is observed at lower electron densities (rs g 10). The approach we use is based on the behaviour of electrons at low densities. We take into account the interactions between electrons and also their interactions with disorder. We determine a zero temperature phase diagram of localised and delocalised states as a function of electron and impurity densities. The phase boundary of the continuous transition is determined by the localisation length of the electrons.
中等电子密度下的连续定域-离域跃迁
我们发现,在量子晶体管的二维电子层中,电子相关性及其与半导体衬底缺陷的相互作用之间的相互作用产生了中间电子密度(5 l rs l 9)的连续定位-离域跃迁。我们将这种跃迁与在较低电子密度(rs g 10)下观察到的不连续金属-绝缘体跃迁区别开。我们使用的方法是基于电子在低密度下的行为。我们考虑了电子之间的相互作用以及它们与无序的相互作用。我们确定了局域态和非局域态的零温度相图作为电子密度和杂质密度的函数。连续跃迁的相边界由电子的局域化长度决定。
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