Impact of NBTI Aging on Self-Heating in Nanowire FET

Om. Prakash, H. Amrouch, S. Manhas, J. Henkel
{"title":"Impact of NBTI Aging on Self-Heating in Nanowire FET","authors":"Om. Prakash, H. Amrouch, S. Manhas, J. Henkel","doi":"10.23919/DATE48585.2020.9116267","DOIUrl":null,"url":null,"abstract":"This is the first work that investigates the impact of Negative Bias Temperature Instability (NBTI) on the Self-Heating (SH) phenomenon in Silicon Nanowire Field-Effect Transistors (SiNW-FETs). We investigate the individual as well as joint impact of NBTI and SH on pSiNW-FETs and demonstrate that NBTI-induced traps mitigate SH effects due to reduced current densities. Our Technology CAD (TCAD)-based SiNW-FET device is calibrated against experimental data. It accounts for thermodynamic and hydrodynamic effects in 3-D nano structures for accurate modeling of carrier transport mechanisms. Our analysis focuses on how lattice temperature, thermal resistance and thermal capacitance of pSiNW-FETs are affected due to NBTI, demonstrating that accurate self-heating modeling necessitates considering the effects that NBTI aging has over time. Hence, NBTI and SH effects need to be jointly and not individually modeled. Our evaluation shows that an individual modeling of NBTI and SH effects leads to a noticeable overestimation of the overall induced delay increase in circuits due to the impact of NBTI traps on SH mitigation. Hence, it is necessary to model NBTI and SH effects jointly in order to estimate efficient (i.e. small, yet sufficient) timing guardbands that protect circuits against timing violations, which will occur at runtime due to delay increases induced by aging and self-heating.","PeriodicalId":289525,"journal":{"name":"2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/DATE48585.2020.9116267","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

This is the first work that investigates the impact of Negative Bias Temperature Instability (NBTI) on the Self-Heating (SH) phenomenon in Silicon Nanowire Field-Effect Transistors (SiNW-FETs). We investigate the individual as well as joint impact of NBTI and SH on pSiNW-FETs and demonstrate that NBTI-induced traps mitigate SH effects due to reduced current densities. Our Technology CAD (TCAD)-based SiNW-FET device is calibrated against experimental data. It accounts for thermodynamic and hydrodynamic effects in 3-D nano structures for accurate modeling of carrier transport mechanisms. Our analysis focuses on how lattice temperature, thermal resistance and thermal capacitance of pSiNW-FETs are affected due to NBTI, demonstrating that accurate self-heating modeling necessitates considering the effects that NBTI aging has over time. Hence, NBTI and SH effects need to be jointly and not individually modeled. Our evaluation shows that an individual modeling of NBTI and SH effects leads to a noticeable overestimation of the overall induced delay increase in circuits due to the impact of NBTI traps on SH mitigation. Hence, it is necessary to model NBTI and SH effects jointly in order to estimate efficient (i.e. small, yet sufficient) timing guardbands that protect circuits against timing violations, which will occur at runtime due to delay increases induced by aging and self-heating.
NBTI老化对纳米线场效应管自热的影响
这是第一个研究负偏置温度不稳定性(NBTI)对硅纳米线场效应晶体管(sinw - fet)中自热(SH)现象影响的工作。我们研究了NBTI和SH对psinw - fet的单独和联合影响,并证明NBTI诱导的陷阱由于电流密度降低而减轻了SH效应。我们的基于技术CAD (TCAD)的SiNW-FET器件是根据实验数据校准的。它考虑了三维纳米结构中的热力学和流体动力学效应,从而精确地模拟了载流子输运机制。我们的分析重点是NBTI对psinw - fet晶格温度、热阻和热电容的影响,表明精确的自热建模需要考虑NBTI老化随时间的影响。因此,NBTI和SH效应需要联合而不是单独建模。我们的评估表明,由于NBTI陷阱对SH缓解的影响,对NBTI和SH效应的单独建模导致了对电路中总体诱导延迟增加的明显高估。因此,有必要对NBTI和SH效应进行联合建模,以估计有效的(即小但足够的)时序保护带,保护电路免受时序违规,这将在运行时由于老化和自热引起的延迟增加而发生。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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