{"title":"Wafer FAB exhaust management strategies","authors":"M. Sherer","doi":"10.1109/ISEE.2006.1650073","DOIUrl":null,"url":null,"abstract":"Many wafer fabs have exhaust management challenges, which includes point-of-use (POU) abatement device decisions. Initially it is important to summarize general rules for exhaust management and POU abatement devices in a wafer fab, which can assist when developing solutions. Wafer fabs that have a fab exhaust management strategy provide a consistent approach to selecting best POU abatement devices and determining exhaust management practices. The fab exhaust management strategy is used to develop a process-specific exhaust management plan","PeriodicalId":141255,"journal":{"name":"Proceedings of the 2006 IEEE International Symposium on Electronics and the Environment, 2006.","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2006 IEEE International Symposium on Electronics and the Environment, 2006.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEE.2006.1650073","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Many wafer fabs have exhaust management challenges, which includes point-of-use (POU) abatement device decisions. Initially it is important to summarize general rules for exhaust management and POU abatement devices in a wafer fab, which can assist when developing solutions. Wafer fabs that have a fab exhaust management strategy provide a consistent approach to selecting best POU abatement devices and determining exhaust management practices. The fab exhaust management strategy is used to develop a process-specific exhaust management plan