Non-hysteretic ferroelectric tunnel FET with improved conductance at Curie temperature

L. Lattanzio, G. Salvatore, A. Ionescu
{"title":"Non-hysteretic ferroelectric tunnel FET with improved conductance at Curie temperature","authors":"L. Lattanzio, G. Salvatore, A. Ionescu","doi":"10.1109/DRC.2010.5551937","DOIUrl":null,"url":null,"abstract":"Tunnel FETs (TFETs) have attracted much interest in the last decade for their potential to be used as small slope switches [1,2], suitable for future logic circuits operating with a supply voltage smaller than 0.5 V and for reduced Ioff levels. It has been shown that these devices highly benefit from a high gate dielectric constant, as the gate-channel capacitive coupling is improved, positively impacting the band-to-band tunneling at low voltages [3]. Temperature-dependent performances have also been studied: models and experiments show a slight degradation of TFET subthreshold slope and an increase in the Ion with temperature, due to energy bandgap narrowing [4,5]. In parallel, the integration of ferroelectric materials in MOSFET gate stacks is being considered for enhancing their subthreshold swing [6]. Furthermore, ferroelectric materials show a unique temperature behavior. According to Landau's theory, at the Curie temperature (TC) the relative dielectric permittivity εFe ideally diverges [7] (Fig. 1).","PeriodicalId":396875,"journal":{"name":"68th Device Research Conference","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"68th Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2010.5551937","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12

Abstract

Tunnel FETs (TFETs) have attracted much interest in the last decade for their potential to be used as small slope switches [1,2], suitable for future logic circuits operating with a supply voltage smaller than 0.5 V and for reduced Ioff levels. It has been shown that these devices highly benefit from a high gate dielectric constant, as the gate-channel capacitive coupling is improved, positively impacting the band-to-band tunneling at low voltages [3]. Temperature-dependent performances have also been studied: models and experiments show a slight degradation of TFET subthreshold slope and an increase in the Ion with temperature, due to energy bandgap narrowing [4,5]. In parallel, the integration of ferroelectric materials in MOSFET gate stacks is being considered for enhancing their subthreshold swing [6]. Furthermore, ferroelectric materials show a unique temperature behavior. According to Landau's theory, at the Curie temperature (TC) the relative dielectric permittivity εFe ideally diverges [7] (Fig. 1).
在居里温度下具有改进电导的非迟滞铁电隧道场效应管
隧道场效应管(tfet)在过去十年中引起了人们的极大兴趣,因为它们具有用作小斜率开关的潜力[1,2],适用于未来的逻辑电路,在小于0.5 V的电源电压下工作,并用于降低关断电平。研究表明,这些器件从高栅极介电常数中受益匪浅,因为栅极-通道电容耦合得到了改善,对低电压下的带对带隧穿产生了积极影响。温度依赖性的性能也得到了研究:模型和实验表明,由于能量带隙缩小,TFET亚阈值斜率略有下降,离子随温度升高而增加[4,5]。同时,铁电材料在MOSFET栅极堆中的集成也被考虑用于提高其亚阈值摆动[6]。此外,铁电材料表现出独特的温度行为。根据朗道理论,在居里温度(TC)下,相对介电常数εFe理想地发散[7](图1)。
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