Single Trap Profiling by Charge Pumping

S. Okhonin, V. Meyer, A. Ils, P. Fazan, L. Risch, F. Hoffman
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Abstract

We demonstrate that the CP characteristic of a single trap can be measured in relatively large MOSFETs or even in arrays of MOSFETs with common gates, common sources and separated drain contacts where the total quantity of interface traps can be as high as several thousands. The influence of CP parameters is also demonstrated. The possibility to use these results to study the influence of single trap on the GIDL is discussed.
电荷泵送的单阱剖面
我们证明了单个陷阱的CP特性可以在相对较大的mosfet中测量,甚至可以在具有共同栅极,共同源和分离漏极触点的mosfet阵列中测量,其中界面陷阱的总数可以高达数千个。还论证了CP参数的影响。讨论了利用这些结果研究单阱对GIDL影响的可能性。
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