Pulsed laser deposition of LiNbO/sub 3//LiTaO/sub 3/ multilayer films on SiO/sub 2//Si(100) substrate

Abstract

LiNbO/sub 3//LiTaO/sub 3/ (LN/LT) multilayer films are grown on Si(100) wafer coated with a SiO/sub 2/ buffer layer by pulsed laser deposition. Both LN and LT layers are polycrystalline, exhibiting some degree of c-texture, and their compositions are nearly stoichiometric. The film surfaces are smooth, crack free and lack large droplets. The film/substrate interface is sharp and no compositional interdiffusion is detected. Optical waveguide properties are demonstrated. Both TE and TM modes are excited and light propagates well in the alternating LN/LT layers. The average refractive index and thickness of the LN/LT multilayer films are calculated.