CNTFETs: modelling and circuit design

Amandeep Singh, M. Khosla, B. Raj
{"title":"CNTFETs: modelling and circuit design","authors":"Amandeep Singh, M. Khosla, B. Raj","doi":"10.1049/pbcs073f_ch13","DOIUrl":null,"url":null,"abstract":"In this book chapter, a brief introduction is provided to CNTs, its material science, modelling, simulation and circuit application. CNTs are explored from electronic properties as the nature of conduction, i.e., metallic and semiconducting. Chirality is explained, which is responsible for basic parameters calculations like diameter and bandgap. Considering the excellent characteristics of CNT, how they are used as channel materials in MOSFETs is discussed along with the type of CNTFET. The physics behind the working of CNTFET is explained for every type along with advantages and disadvantages of device type. Since CNTFETs have many challenges for future devices, the most important challenge of doping is discussed along with the novel solution, i.e., electrostatic doping. The concept of electrostatic doping is explained with the help of a band diagram as how the biases at polarity gates are used to shift the bands the same as in conventional doping. The characteristics of an ED device are compared with a conventional doped device in order to get better understanding and advantage of the device. The only available benchmark simulation tool for CNTFETs is discussed along with the model used in calculations of drain current. Also the different types of CNTFETs are simulated in this tool, and the characteristics are shown. Apart from conventional CNTFET, ED CNTFET is also simulated in the tool in order to check the results. Along with numerical tool for simulation, the various approaches that can be used to model the device are discussed. The equations are explained with device physics for both conventional CNTFET and ED CNTFET. Lastly, the circuit applications are discussed ranging from analog to digital applications.","PeriodicalId":413845,"journal":{"name":"VLSI and Post-CMOS Electronics. Volume 1: Design, modelling and simulation","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"VLSI and Post-CMOS Electronics. Volume 1: Design, modelling and simulation","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1049/pbcs073f_ch13","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this book chapter, a brief introduction is provided to CNTs, its material science, modelling, simulation and circuit application. CNTs are explored from electronic properties as the nature of conduction, i.e., metallic and semiconducting. Chirality is explained, which is responsible for basic parameters calculations like diameter and bandgap. Considering the excellent characteristics of CNT, how they are used as channel materials in MOSFETs is discussed along with the type of CNTFET. The physics behind the working of CNTFET is explained for every type along with advantages and disadvantages of device type. Since CNTFETs have many challenges for future devices, the most important challenge of doping is discussed along with the novel solution, i.e., electrostatic doping. The concept of electrostatic doping is explained with the help of a band diagram as how the biases at polarity gates are used to shift the bands the same as in conventional doping. The characteristics of an ED device are compared with a conventional doped device in order to get better understanding and advantage of the device. The only available benchmark simulation tool for CNTFETs is discussed along with the model used in calculations of drain current. Also the different types of CNTFETs are simulated in this tool, and the characteristics are shown. Apart from conventional CNTFET, ED CNTFET is also simulated in the tool in order to check the results. Along with numerical tool for simulation, the various approaches that can be used to model the device are discussed. The equations are explained with device physics for both conventional CNTFET and ED CNTFET. Lastly, the circuit applications are discussed ranging from analog to digital applications.
cntfet:建模和电路设计
在本章中,简要介绍了碳纳米管及其材料科学、建模、仿真和电路应用。碳纳米管是从导电性质的电子性质,即金属性和半导体性来探索的。手性的解释,负责基本参数的计算,如直径和带隙。考虑到碳纳米管的优异特性,讨论了如何在mosfet中使用碳纳米管作为沟道材料,以及碳纳米管的类型。解释了每种类型的CNTFET工作背后的物理原理以及器件类型的优缺点。由于cntfet在未来的器件中面临许多挑战,因此讨论了掺杂最重要的挑战以及新的解决方案,即静电掺杂。静电掺杂的概念在带图的帮助下解释了极性门的偏置如何像在常规掺杂中一样被用来移动带。为了更好地理解ED器件的优点,将其与传统掺杂器件的特性进行了比较。讨论了cntfet唯一可用的基准仿真工具以及用于漏极电流计算的模型。利用该工具对不同类型的cntfet进行了仿真,并给出了其特性。除了常规CNTFET外,还在工具中模拟了ED CNTFET,以检查结果。并结合数值模拟工具,讨论了可用于器件建模的各种方法。从器件物理角度解释了传统CNTFET和ED CNTFET的方程。最后,讨论了从模拟应用到数字应用的电路应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信