A Novel Test Structure for Sub-micron CMOS Leakage Characterisation and Modelling

Z. Ning, S. Hoste, W. Vanderbauwhede, R. Gillon, M. Tack, P. Raes
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Abstract

This paper presents a novel test structure for the characterisation and modelling of CMOS leakage current, with which all leakage components can be directly extracted automatically and input/output influence is cancelled. The test structure can also be used for measurement of Intrinsic Iddq for defect detection.
一种新型的亚微米CMOS泄漏表征与建模测试结构
本文提出了一种新型的CMOS泄漏电流表征和建模测试结构,该结构可以直接自动提取所有泄漏分量,并消除输入/输出影响。测试结构也可用于测量缺陷检测的固有Iddq。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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