Proton response of low-frequency noise in 0.20 /spl mu/m 90 GHz f/sub T/ UHV/CVD SiGe HBTs

Z. Jin, J. Cressler, G. Niu, P. Marshall, H.S. Kim, R. Reed, A. Joseph
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Abstract

The influence of proton exposure on the low-frequency noise of 0.20 /spl mu/m UHV/CVD SiGe HBTs is presented for the first time. The noise degradation after irradiation shows a strong dependence on transistor geometry. Our previous noise theory is used to understand this behavior, and a comparison is made between these new results on third generation SiGe technology and our prior results on first generation SiGe technology.
0.20 /spl mu/m 90 GHz f/sub / UHV/CVD SiGe hts低频噪声的质子响应
首次研究了质子暴露对0.20 /spl mu/m UHV/CVD SiGe HBTs低频噪声的影响。辐照后的噪声衰减与晶体管的几何形状密切相关。我们使用之前的噪声理论来理解这种行为,并将这些关于第三代SiGe技术的新结果与我们之前关于第一代SiGe技术的结果进行了比较。
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