GaInP/GaAs tunnel collector HBTs: base-collector barrier height analysis

D. Keogh, R. Welty, J. López-González, C. Lutz, R. Welser, P. Asbeck
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引用次数: 1

Abstract

Tunnel collector HBTs employ a thin layer of GaInP between the GaAs base and collector regions, in order to suppress hole injection when the base-collector junction is forward biased. Devices with a low offset voltage of 30 mV, and low knee voltage of /spl sim/0.3 V, while still maintaining high current gain (170), and good RF performance with f/sub T/=54 GHz and f/sub MAX/=68 GHz have been demonstrated. The devices exhibit increased output conductance as compared to conventional GaInP/GaAs SHBTs, due to a residual barrier at the base-collector junction. This paper presents an experimental method for the determination of such barriers, by analyzing the collector current as a function of applied base-collector voltage, V/sub CB/.
GaInP/GaAs隧道集电极HBTs:基-集电极势垒高度分析
隧道集电极HBTs在GaAs基极和集电极区域之间使用一层薄的GaInP,以抑制基极-集电极结正向偏置时的空穴注入。器件具有30 mV的低偏置电压和/spl sim/0.3 V的低膝电压,同时仍然保持高电流增益(170),以及f/sub T/=54 GHz和f/sub MAX/=68 GHz的良好射频性能。与传统的GaInP/GaAs shbt相比,由于在基极-集电极结处存在残留的势垒,该器件的输出电导增加。本文通过分析集电极电流随外加基极-集电极电压V/sub CB/的函数关系,提出了一种测定这种势垒的实验方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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