Molecular dynamics simulation on LO phonon mode decay in Si nano-structure covered with oxide films

T. Zushi, I. Ohdomari, T. Watanabe, Y. Kamakura, K. Taniguchi
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引用次数: 1

Abstract

A series of molecular dynamics (MD) simulations is conducted to investigate the dynamics of longitudinal optical (LO) phonon in Si nano-structure confined with oxide films. This work is motivated by heat issues in nanoscopic devices; it is considered that the LO phonons with low group velocity are accumulated in the nanoscopic device and the electric property deteriorates. We estimate the relaxation time of the LO phonon and investigate its dependency on the oxide thickness. The calculation results show that the LO phonon decays faster as the oxide thickness increases and turns into acoustic phonon. The result indicates that the presence of SiO2 films promotes the scattering of the phonon and this is effective to diminish the optical phonon.
氧化膜覆盖硅纳米结构中LO声子模式衰减的分子动力学模拟
采用分子动力学方法研究了受氧化膜约束的硅纳米结构中纵向光学声子的动力学特性。这项工作的动机是纳米级器件中的热问题;认为低群速度的LO声子在纳米级器件中积累,电性能变差。我们估计了LO声子的弛豫时间,并研究了它与氧化物厚度的关系。计算结果表明,随着氧化物厚度的增加,LO声子衰减速度加快,并转变为声子。结果表明,SiO2薄膜的存在促进了声子的散射,从而有效地减小了光学声子的存在。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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