A circuit technique for leakage power reduction in CMOS VLSI circuits

Venkata Ramakrishna Nandyala, K. Mahapatra
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引用次数: 15

Abstract

Scaling of CMOS technology improved the speed nevertheless the leakage currents are leftover as an adverse effect. The problem has taken a serious turn as the scaling extends into ultra-deep-submicron (UDSM) region. These unsolicited leakage currents should be minimized for the smooth functioning of the circuit. Designing of such leakage free nanoscale CMOS circuits turns to be a challenging task. In this work, we address the issue of leakage power that arises with the device channel length scaling to sub-100nm. We present a circuit technique to mitigate the leakage currents of MOSFET through controlling the voltage at the source terminal of the MOSFET. CMOS inverter designed using the proposed technique results in 98% and 30% improvement in static and total power dissipation respectively compared with its conventional design. The simulation results of NAND and NOR gates designed using the same technique indicates 15.89% and 18.83% improvement in the total power compared with their corresponding conventional designs. 11-stage CMOS ring oscillator designed using the proposed technique is analyzed, and corresponding simulation results are reported. Comparison of the proposed circuits in terms of power dissipation and delay with two existing techniques is presented. The circuits designed using the proposed technique results in good Power-Delay Product (PDP).
一种降低CMOS VLSI电路泄漏功率的电路技术
CMOS技术的缩放提高了速度,但漏电流仍然是一个不利的影响。随着尺度扩展到超深亚微米(UDSM)区域,问题变得更加严重。为了电路的平稳运行,应尽量减少这些非请求泄漏电流。设计这种无泄漏的纳米级CMOS电路是一项具有挑战性的任务。在这项工作中,我们解决了随着器件通道长度缩放到100nm以下而产生的泄漏功率问题。提出了一种通过控制MOSFET源端电压来减小MOSFET漏电流的电路技术。采用该技术设计的CMOS逆变器,其静态功耗和总功耗分别比传统设计提高98%和30%。采用相同技术设计的NAND门和NOR门的仿真结果表明,与传统设计相比,总功率分别提高了15.89%和18.83%。分析了采用该技术设计的11级CMOS环形振荡器,并给出了相应的仿真结果。将所提出的电路与现有的两种技术在功耗和时延方面进行了比较。采用该技术设计的电路具有良好的功率延迟积(PDP)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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