Enhanced tracing and visibility in logic emulation environment by optimized design slicing

S. Banerjee, T. Gupta
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Abstract

Field Programmable Gate Array (FPGA) based logic emulators, used for functional verification of large and complex System-on-chip (SoC) designs are characterized by two conflicting requirements - execution speed and signal visibility. Achieving 100% signal visibility in post-processing debug for long emulation runs impacts execution speed and requires large amount of disk space. Techniques like combinational reconstruction, periodic snapshot based tracing, state restoration etc. have reduced the amount of trace data and hence the impact on execution speed to some extent, but fail to provide a scalable solution for growing design sizes. Selective tracing based on signal list specification does not guarantee tracing all relevant signals needed to be investigated to debug a functional mismatch, often requiring re-runs to generate relevant data. This paper presents a novel tracing and visibility system based on the concept of optimized design slicing (ODS), which minimizes trace data while providing sufficient debug visibility by tracing only a set of design portions or “slices” that are likely to affect values of a set of “observed variables”, or in other words influence a set of properties under verification. These slices are extracted automatically from the design logic and capture all the signals likely to impact the observed variables, ensuring sufficient debug visibility. The slices are “optimized” by techniques like software memory replay and blackbox elimination. The proposed system achieves effective reduction in trace data, higher execution speed and provides necessary debug visibility for post-processing debug.
通过优化设计切片,增强了逻辑仿真环境的跟踪和可见性
基于现场可编程门阵列(FPGA)的逻辑仿真器用于大型和复杂的片上系统(SoC)设计的功能验证,其特点是两个相互冲突的要求-执行速度和信号可见性。在长时间仿真运行的后处理调试中实现100%的信号可见性会影响执行速度,并且需要大量的磁盘空间。组合重构、基于定时快照的跟踪、状态恢复等技术减少了跟踪数据的数量,因此在一定程度上影响了执行速度,但无法为不断增长的设计规模提供可扩展的解决方案。基于信号列表规范的选择性跟踪不能保证跟踪调试功能不匹配所需的所有相关信号,通常需要重新运行以生成相关数据。本文提出了一种基于优化设计切片(ODS)概念的新颖跟踪和可见性系统,该系统通过仅跟踪可能影响一组“观察变量”值的一组设计部分或“切片”来最小化跟踪数据,同时提供足够的调试可见性,换句话说,影响正在验证的一组属性。这些片段从设计逻辑中自动提取,并捕获可能影响观察到的变量的所有信号,从而确保足够的调试可见性。这些片段通过软件记忆回放和黑盒消除等技术进行“优化”。该系统有效地减少了跟踪数据,提高了执行速度,并为后处理调试提供了必要的调试可见性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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