Investigations on the Short-Circuit Degradation and its Mechanism of 1.2-KV 19-A SiC power MOSFETs

J. L. Wang, Y. Chen, Z. He, Y. En, X. B. Xu, Y. Huang, K. Geng
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引用次数: 3

Abstract

To provide a guideline for converter design and fault protection, the failure mechanism and reliability of silicon carbide (SiC) power MOSFETs needs to be further investigated. In this paper, the failure mechanism during short-circuit (SC) of commercial 1.2-KV/19-A SiC power MOSFETs was investigated. After the SC tests, the Ids of the device decreased significantly. Moreover, it was found that the Vth and Igs increased obviously. The results demonstrated that negative charges were captured by the gate oxide and accumulated during the SC tests, which is eventually causes degradation of the gate oxide. The results of this study may be useful in the design and application of SiC power MOSFETs.
1.2 kv 19a SiC功率mosfet短路退化及其机理研究
为了给变换器设计和故障保护提供指导,需要进一步研究碳化硅功率mosfet的失效机理和可靠性。本文研究了商用1.2 kv / 19a SiC功率mosfet的短路失效机理。SC测试后,设备的id值明显下降。此外,还发现Vth和Igs明显增加。结果表明,负电荷被栅极氧化物捕获并在SC测试过程中积累,最终导致栅极氧化物的降解。研究结果对SiC功率mosfet的设计和应用具有一定的指导意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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