130nm InP DHBTs with ft >0.52THz and fmax >1.1THz

M. Urteaga, R. Pierson, P. Rowell, V. Jain, E. Lobisser, M. Rodwell
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引用次数: 87

Abstract

We report results from a 130nm Indium Phosphide (InP) double heterojunction bipolar transistor (DHBT) technology. A 0.13×2µm2 transistor exhibits a current gain cutoff frequency ft >520GHz, with a simultaneous extrapolated power gain cutoff frequency fmax>1.1THz. The HBTs exhibit these RF figures-of-merit while maintaining a common-emitter breakdown voltage BVCEO=3.5V (JE=10µA/µm2). Additionally, scaling of the emitter junction length to 2µm enables high device performance at low total power levels. Transistors in the InGaAs/InP material system have demonstrated the highest reported transistor RF figures-of-merit. Previous published results include strained-InGaAs channel high-electron mobility transistors (HEMTs) with fmax of >1THz [1,2], and InP DHBTs with fmax >800GHz [3]. High bandwidth DHBTs have applications in a number of RF and mixed-signal applications due to their high power handling and high levels of integration relative to HEMTs. The HBTs reported in this work are designed for transceiver applications at the lower end of the THz frequency band [0.3–3 THz].
130nm InP dhbt, ft >0.52THz, fmax >1.1THz
我们报告了一种130纳米磷化铟(InP)双异质结双极晶体管(DHBT)技术的结果。0.13×2µm2晶体管的电流增益截止频率ft >520GHz,同时外推功率增益截止频率fmax>1.1THz。在保持共发射极击穿电压BVCEO=3.5V (JE=10µa /µm2)的情况下,HBTs表现出这些射频性能指标。此外,将发射极结长度缩放至2 μ m,可在低总功率水平下实现高器件性能。InGaAs/InP材料系统中的晶体管显示出最高的晶体管射频性能。先前发表的结果包括fmax >1THz的应变ingaas通道高电子迁移率晶体管(hemt)[1,2]和fmax >800GHz的InP dhbt[3]。高带宽dhbt由于其高功率处理和相对于hemt的高集成度,在许多RF和混合信号应用中得到了应用。本工作中报道的hbt是为太赫兹频段(0.3-3太赫兹)低端的收发器应用而设计的。
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