Picosecond Photorefractive and Free-Carrier Nonlinearities in Semiconductors

A. Smirl, J. Dubard, G. Valley, T. Boggess
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Abstract

A variety of picosecond time-resolved two-beam coupling, transient grating and degenerate-four-wave mixing techniques are used to investigate the nonlinear loss and to measure the strength, formation and decay of photorefractive gratings written in GaAs and InP:Fe and of free-carrier gratings written in Si, GaAs, and InP by 43-ps pulses at a wavelength of 1 μm. We present data and numerical calculations as a function of fluence, time delay, pump-to-probe ratio, pump polarization, analyzer angle and crystal orientation. We observe photorefractive gains of a few percent at fluences of a few pJ/μm2 (0.1 mJ/cm2) in GaAs and InP, and we identify two sources for the photorefractive space-charge field. It is principally between mobile free carriers and stationary single-photon ionized donors at low fluences and between mobile electrons and holes produced by two-photon absorption at high fluences. We also observe strong transient energy transfer from the nominally "unshifted" free-carrier index gratings written in GaAs and InP by two-photon absorption and in Si by single-photon indirect absorption. We have demonstrated optical switches based on the pump-induced photorefractive rotation of the probe polarization in GaAs with on/off ratios of >2/1 at fluences as low as 400 fJ/μm2 and optical switches based on free-carrier transient-energy-transfer with on/off ratios >20,000/1 at 200 pJ/μm2. We have also used transient-energy-transfer to construct weak beam amplifiers with gains >25 at 30 mJ/cm2. Finally, these techniques have been used to obtain information about the properties of the deep-level (mid-gap) states in GaAs (EL2/EL2+) and InP (Fe2+/Fe3+), such as the cross sections and number densities.
半导体中的皮秒光折变和自由载流子非线性
利用各种皮秒级时间分辨双光束耦合、瞬态光栅和简并四波混频技术,在波长为1 μm的43-ps脉冲下,研究了以GaAs和InP:Fe编写的光折变光栅以及以Si、GaAs和InP编写的自由载流子光栅的非线性损耗和强度、形成和衰减。我们给出了数据和数值计算作为影响、时间延迟、泵与探针比、泵极化、分析仪角度和晶体取向的函数。我们在GaAs和InP中观察到,在几个pJ/μm2 (0.1 mJ/cm2)的影响下,光折变增益为几个百分点,并确定了光折变空间电荷场的两个来源。它主要发生在移动自由载流子和固定的单光子电离供体之间,以及在高通量下由双光子吸收产生的移动电子和空穴之间。我们还观察到名义上“未移位”的自由载流子折射率光栅通过双光子吸收写入GaAs和InP,通过单光子间接吸收写入Si。我们已经演示了基于泵浦诱导探针偏振光折变旋转的GaAs光开关,在低至400 fJ/μm2时开关/关比>2/1,以及基于自由载波瞬态能量转移的光开关,在200 pJ/μm2时开关/关比>20,000/1。我们还使用瞬态能量转移来构建增益>25的弱光束放大器,增益为30 mJ/cm2。最后,这些技术被用于获得GaAs (EL2/EL2+)和InP (Fe2+/Fe3+)中深能级(中隙)态的性质信息,如截面和数量密度。
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