High performance, high yield InP DHBT production process for 40 Gbps applications

D. Sawdai, E. Kaneshiro, A. Gutierrez-Aitken, P. Grossman, K. Sato, W. Kim, G. Leslie, J. Eldredge, T. Block, P. Chin, L. Tran, A. Oki, D. Streit
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引用次数: 24

Abstract

High-speed digital logic is essential in diverse applications such as optical communication, frequency synthesizers, and analog-digital conversion. Current research efforts indicate that technologies utilizing heterojunction bipolar transistors (HBTs) are the preferred approach for systems operating at clock frequencies of 40 GHz and above. This need for higher performance electronics for space and defense applications has driven the development of InP HBTs at TRW. Consistent and continuous improvements from the baseline MBE structure and process technology have enhanced frequency performance, breakdown voltage, producibility, yield, reliability such that InP HBTs are being used successfully for many commercial, space, and defense applications. This paper describes our optimized high-yield production InP DHBT process which simultaneously combines f/sub T/>170 GHz, f/sub max/>190 GHz, and breakdown voltage /spl sim/7 V.
高性能,高产量的InP DHBT生产工艺,适用于40 Gbps应用
高速数字逻辑在光通信、频率合成器和模数转换等各种应用中是必不可少的。目前的研究表明,利用异质结双极晶体管(hbt)的技术是在40 GHz及以上时钟频率下工作的系统的首选方法。这种对空间和国防应用中更高性能电子产品的需求推动了TRW InP hbt的发展。从基本的MBE结构和工艺技术不断改进,提高了频率性能、击穿电压、可生产性、良率和可靠性,使InP HBTs成功地用于许多商业、航天和国防应用。本文介绍了同时结合f/sub T/>170 GHz、f/sub max/>190 GHz和击穿电压/spl sim/7 V的高产产InP DHBT工艺优化方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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