A Simulation Study of Multi-Channel AlInN/GaN Schottky Barrier Diodes and Experimental Comparison with Low On-resistance of 1.9 Ω•mm

Yongxin Li, Ang Li, Chong Wang
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Abstract

In this work, a five channel lattice-matched AlInN/GaN heterostructure SBD is presented to improve the DC characteristics based on Silvaco-Atlas software and the simulation results. The influences of the number of channels, the thickness of the barrier layer, the In composition of the barrier layer, and the anode-cathode distance (Lac) are theoretically investigated. For an Al0.83In0.17N diode, compared with single channel devices, it offers a reduction of 68% in on-resistance, RON (from 6.25 to 1.98 Ω•mm), and 28% (from 1.25 to 0.91 V) in forward voltage, VF. The 2DEG sheet density increases significantly as the In composition decreases and the Al composition increases. When the thickness of the barrier layer increases, the confinement effect of the quantum well will strengthen, and the performance of SBD will be optimized. Finally, we demonstrated a five-channel AlInN/GaN heterojunction SBD sample with VF of 0.81 V and RON of 1.9 Ω•mm which is in high agreement with simulation results and is much better than those conventional AlGaN/GaN heterojunction SBDs with the same device area.
多通道AlInN/GaN肖特基势垒二极管的仿真研究及低导通电阻1.9 Ω•mm的实验比较
本文基于Silvaco-Atlas软件和仿真结果,提出了一种改进直流特性的五通道晶格匹配AlInN/GaN异质结构SBD。从理论上研究了通道数、势垒层厚度、势垒层的In组成和阳极-阴极距离(Lac)的影响。对于Al0.83In0.17N二极管,与单通道器件相比,其导通电阻RON(从6.25降至1.98 Ω•mm)降低68%,正向电压VF降低28%(从1.25降至0.91 V)。随着In成分的减少和Al成分的增加,2DEG板密度显著增加。当势垒层厚度增加时,量子阱的约束效应将增强,SBD的性能将得到优化。最后,我们展示了一个五通道aln /GaN异质结SBD样品,VF为0.81 V, RON为1.9 Ω•mm,与仿真结果高度一致,并且远远优于相同器件面积的传统AlGaN/GaN异质结SBD。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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